Heiwa

Consonants

 * Plain plosives and fricatives are aspirated word-initially
 * Plain plosives are unreleased word-finally
 * Plain plosives and fricatives are voiced following nasals
 * Plain plosives and fricatives are voiced preceding nasals word-medially
 * Velars and Uvulars assimilate when adjacent to one another with the initial consonant having dominance
 * Sonorants are preglottalized following ejective consonants
 * Clusters of /ʔ/ or /h/ plus a sonorant are realized as preglottalized or voiceless, respectively

Vowels

 * Uvular lowering: close vowels open to mid vowels near uvular consonants
 * Vowels become nasalized when preceeding nasal consonants
 * Final /h/ is realized as breathy voice on the previous vowel

Phonotactics
The canonical syllable structure for Heiwa is (C)(C)V(C). Roots may be of the form (C)(C)V(C)[(C)V(C)]. Marked forms may be an indefinite series of (C)(C)V(C)... so long as medial clusters remain binary.

Initial clusters are limited to:

Plosive/Fricative + Nasal/Approximant

Nasal + Approximant

Medial Clusters may be:

Plosive/Fricative + Nasal/Approximant

Nasal + Approximant/Plosive/Fricative

Fricative + Plosive

Plosive + Fricative

Stress
Stress is weight sensitive and falls on the heaviest syllable. It is realized as a rise in pitch.

Generally, the more sonorous a syllable the lighter it is, and conversely, the more obstruent, the heavier it is.

V ~ Vcreaky <  V: <  CV ~ CVcreaky < CCV ~ CV: ~ CVC < CCVcreaky ~ CCV: ~ CV:C ~ CVcreakyC < CCVC ~ CCVcreakyC < CCV:C

Declension
Heiwa nouns decline for 3 numbers and 22 cases.

The nominal template is as follows: